TY  - DATA

T1  - Tribochemical Nanolithography: Selective Mechanochemical Removal of Photocleavable Nitrophenyl Protecting Groups with 23 nm Resolution at Speeds of up to 1 mm s­¬–1

PY  - -0001/11/30

AU  - Leggett G

ED  - 

DO  - DOI: 10.15131/shef.data.21842718

Y2  - 2026/06/05

ER  -