@inproceedings{inproceedings, title  = {{Metrology of deep trench etched memory structures using 3D scatterometry}},

 url = {{}},

 year = {{2005}},

 month = {{5}},

 author = {{Reinig P and Dost R and Mort M and Hingst T and Mantz U and Moffitt J and Shakya S and Raymond CJ and Littau M}},

 doi = {{10.1117/12.599342}},

 volume = {{5752}},

 journal = {{Metrology, Inspection, and Process Control for Microlithography XIX,  Pts 1-3}},

 pages = {{559-569}},

 note = {{Accessed on 2026/07/14}}}