TY  - CONF

T1  - Spectroscopic ellipsometry-based scatterometry for depth and line width measurements of polysilicon-filled deep trenches

JO  - METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2

PY  - 2004/05/24

AU  - Hingst T

AU  - Moert M

AU  - Reinig P

AU  - Backen E

AU  - Dost R

AU  - Weidner P

AU  - Hopkins J

AU  - Dziura T

AU  - Elazami A

AU  - Freed R

ED  - Silver RM

DO  - DOI: 10.1117/12.535646

VL  - 5375

SP  - 587

EP  - 596

Y2  - 2026/07/14

ER  -