TY  - CONF

T1  - Influence of a shallow p+ offset region on a novel edge termination technique using lightly doped p-rings

JO  - CAS '99 Proceedings. 1999 International Semiconductor Conference (Cat. No.99TH8389)

UR  - https://doi.org/10.1109/smicnd.1999.810389

PY  - 1999/12/01

AU  - Bose JVSC

AU  - De Souza MM

AU  - Narayanan EMS

AU  - Spulber O

AU  - Sweet M

ED  - 

DO  - DOI: 10.1109/smicnd.1999.810389

PB  - IEEE

VL  - 1

SP  - 63

EP  - 66

Y2  - 2025/11/24

ER  -