TY  - CONF

T1  - Influence of Chemical Dopant Technique to Reduce Schottky Barriers of Pd-Contacted CNTFETs

JO  - MRS Proceedings

UR  - https://doi.org/10.1557/proc-0963-q10-62

PY  - 2011/02/01

AU  - Casterman D

AU  - De Souza MM

ED  - 

DO  - DOI: 10.1557/proc-0963-q10-62

PB  - Springer Science and Business Media LLC

VL  - 963

Y2  - 2025/12/07

ER  -