TY  - JOUR

T1  - Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused ion-beam etching

JO  - Applied Physics A

UR  - https://doi.org/10.1007/s00339-009-5319-7

PY  - 2009/07/01

AU  - Kettle J

AU  - Hoyle RT

AU  - Dimov S

ED  - 

DO  - DOI: 10.1007/s00339-009-5319-7

PB  - Springer Science and Business Media LLC

VL  - 96

IS  - 4

SP  - 819

EP  - 825

Y2  - 2026/09/13

ER  -