Electron Beam Lithography

Our Electron Beam Lithography and supporting fabrication facilities include the Raith Voyager electron beam lithography system: a high-resolution and high-throughput instrument capable of patterning sub 10nm features over areas of up to 150mm x 150mm.


Information about Electron Beam Lithography, our specifications and capabilities, and supporting facilities.

About Electron Beam Lithography at Sheffield

Accessing the facility

The EBL and supporting fabrication facilities are available to researchers across the University. 

Gain access to the facility

Get in touch

Nanoscience and Technology Centre

North Campus

Broad Lane
S3 7HQ

Please direct enquiries to Dr Paul Fry: