Raith Voyager electron beam lithography (EBL) system
A high resolution and high throughput instrument capable of patterning sub 10nm features over areas of up to 150 mm x 150 mm.
Commissioned in summer 2015 and facilitated through a substantial £1.6m investment by the University.
What is EBL?
Electron beam lithography (EBL) is a powerful technique for creating nanostructures that are too small to fabricate with conventional photolithography (Image of Raith Voyager instrument reproduced with permission of Raith GmbH)Find out more>
Can I use it?
The new facility is available to all researchers within the University.Find out more>