Raith Voyager electron beam lithography (EBL) system

A high resolution and high throughput instrument capable of patterning sub 10nm features over areas of up to 150 mm x 150 mm.

Commissioned in summer 2015 and facilitated through a substantial £1.6m investment by the University.

What is EBL?

Electron beam lithography (EBL) is a powerful technique for creating nanostructures that are too small to fabricate with conventional photolithography (Image of Raith Voyager instrument reproduced with permission of Raith GmbH)

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Can I use it?

The new facility is available to all researchers within the University.

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Specifications and Capabilities

The high-performance, turn-key electron beam lithography system is ideally suited to R&D applications

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