Electron Beam Lithography
Our Electron Beam Lithography and supporting fabrication facilities include the Raith Voyager electron beam lithography system: a high-resolution and high-throughput instrument capable of patterning sub 10nm features over areas of up to 150mm x 150mm.
Overview
Information about Electron Beam Lithography, our specifications and capabilities, and supporting facilities.
Accessing the facility
The EBL and supporting fabrication facilities are available to researchers across the University.
Get in touch
Nanoscience and Technology Centre
Broad Lane
S3 7HQ
Please direct enquiries to Dr Paul Fry: