Three Dimensional Maskless Photolithography (3DML)

The Sheffield / Durham partenship established in the 3DI research project has secured funding from EPSRC (EP/C53476X/1 and EP/C534778/1) to build a novel 3D photolithography tool that will enable the rapid patterning of grossly non-planar substrates.

The research will concentrate on the use of spatial light modulators (SLM) to project computer generated holograms (CGH). The instrument will be based on the Intelligent Micro Patterning SF-100.

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